Chemical 3F

Chemical 3F

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Description

New generation of powered air purifying respirator designed to filtrate contaminants in the form of gases, vapours, particles and their combinations.
High level of performance, mechanical and chemical resistance, UV resistance and Ingress protection IP64 guarantee sufficient protection of the wearer even in heavy industrial environments, the chemical industry, laboratories and the pharmaceutical industry. Full colour display clearly shows all the relevant information needed.

Areas of application:
• Most demanding environments
• Chemical industry
• Laboratories
• Pharmaceutical industry
• Remediation operations

Features & benefits:
• High mechanical and chemical resistance
• Resistance to intrusion of liquids and solid particles – IP64
• Can be decontaminated by a shower
• Advanced electronic system for warning the wearer
• Full colour TFT display clearly shows all the relevant information needed
• User modes HOOD / MASK
• Airflow 120–235 lpm
• Li-Ion battery and quick battery charger (charging time < 3 h)

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 Chemical 3F